"Legzöldebb Tanszék 2011, 2012"


Homepage: http://www.patent-dfmm.org/

Period: 2004-2007


The NoE Patent-DfMM aims to establish a collaborative team to provide European industry with support in the field of "Design for Micro and Nano Manufacture, (DfMM)" to ensure that problems affecting the manufacture and reliability of products based on micro nano technologies (MNT) can be addressed before prototype and pre-production.


- Re-structure the European DfMM Community by creating new collaborative   virtual laboratories providing industrial services in :

  • Design-for-test engineering
  • Reliability and characterisation engineering
  • Packaging engineering
  • Modelling and simulation technology

- Create a commercial industrial support service in DfMM technology
- Accelerate the output of trained professionals in DfMM engineering
- Network key equipment facilities and improve academic and commercial access to core capabilities


  • 4M2C (4M2C Patric Salomon GmbH), Germany
  • CCLRC (CCLRC Daresbury Laboratory), England
  • CEA (CEA LETI), France
  • CSL (Universite de Liege), Belgium
  • ENSEIRB (Ecole Nationale Superieure D'Electronique, Informatique et Radiocommunications), France
  • HWU (Heriot Watt University) Scotland
  • IEF (Université Paris XI) France
  • IMEC (Interuniversity MicroElectronics Center) Holland
  • IMS (Fraunhofer IMS) Germany
  • IMT (National Institute for R&D in Microtechnologies) Romania
  • ITEM (Universität Bremen) Germany
  • IZM (Fraunhofer Institute for Reliability and Microintegration)  Germany
  • IZMM (Fraunhofer IZM-M) Germany
  • KUL (K.U.Leuven ESAT-MICAS) Belgium
  • LAAS (LAAS-CNRS - Paul Sabatier University) France
  • LIRMM (Université Montpellier II) France
  • MESA (Universiteit Twente) Holland
  • POLIMI (Politecnico di Milano) Italy
  • QINETIQ (QinetiQ Ltd) England
  • Tyndall (Tyndall National Institute) Ireland
  • ULAN (University of Lancaster) England
  • WUT (Warsaw University of Technology) Poland
© 2019 EET
Thursday, 23 May 2019 News arrow PATENT